喷涂氧化铌靶材 Spray NbOx Target
产品说明Product description
以等离子体为热源将Nb2O5粉末加热到熔融或半熔融状态并高速冲击背管表面形成致密涂层，从而制备出高纯度、高致密度NbOx靶材。
With plasma as heat source, high purity and high density NbOx target is produced from Nb2O5 powder, which is heated to molten or semi-molten state and deposited on the surface of backing tube at high speeds to form dense coatings.
项目 Item | 参数 Specifications | 检测手段 Testing method |
纯度 Purity | ≥99.9% | |
密度 Density | ≥4.7 g/cm3 | 阿基米德密度仪 Archimedes densimeter |
杂质含量 Impurities
| Ta: ≤200 ppm Si: ≤80 ppm Fe: ≤80 ppm Al: ≤30 ppm W: ≤30 ppm Cu: ≤30 ppm 杂质总和 (Total impurity)：≤1000 ppm | 化学分析 Chemical analysis |
电阻率 Electrical resistivity | ≤0.2 Ω∙cm | 四探针电阻率仪 Four probe resistivity meter |
建议功率 Recommended power | 15 kw/m |
背管材质 Backing tube
-选用304/316L不锈钢（无磁）。
靶材尺寸Dimension
-按照图纸要求加工
According to the customized drawings.
应用领域Applications
-主要用于LOW-E镀膜玻璃，薄膜太阳能电池电极膜系，TFT-LCD，半导体电子。
LOW-E glasses, electrodes of thin film solar cells, TFT-LCD, semiconductor devices.
